STRUCTURAL PROPERTIES COMPARISON OF BORON AND ALUMINUM CO-DOPED ZINC OXIDE FILMS DEPOSITED ON POROUS SILICON AND SILICON SUBSTRATE
Abstract
Author(s): Rashid Hashim Jabbar and Anwar Hussein Ali
This paper presents the comparison of structural properties between silicon and porous silicon(PS) structural substrates used in the same conditions to deposition of aluminum boron co-doped ZnO (AZB ) thin films of nanostructures with doping (2,4,6,8 at %.)Deposited at 450 oC on silicon and porous silicon substrates by chemical spray pyrolysis in (150±5 nm) thickness. The structure of AZB nanostructure films has been found to exhibit the hexagonal wurtzite structure. The surface topography of the films and the porous silicon was studied by using the Scanning Electron Microscopy (SEM), Transmission electron microscopy (TEM) and the Atomic Force Microscopy (AFM), the surface concentration shows that the roughness of the thin films increase with the increase of doping concentrations. The structural details and microstructure were obtained from X-ray diffraction, the results shows the grain size decreased with the increase of doping concentration. Keywords: Porous silicon, PS, ZnO nanostructures, boron and aluminum co-doped, structural properties.
